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Thursday, April 18, 2024

All-Round Encapsulation of Silicene – Nanoscale Horizons (RSC Publishing)

Silicene or two-dimensional (2D) graphene-like silicon allotrope has just lately emerged as a promising candidate for varied purposes in nanotechnology. Nevertheless, few considerations involving its stability persist thus far and have to be addressed to construct gadgets which can be compliant and aggressive. Right here, we current an all-around encapsulation methodology past the present state-of-the-art for silicene, sometimes sandwiched in between a capping layer (e.g., Al2O3) and the supporting substrate (e.g., Ag). On this framework, the insertion of 1 or two sacrificial 2D Sn layers allows the belief of various atomically skinny encapsulation schemes, preserving the pristine properties of silicene whereas decoupling it from the expansion template. On the one hand, the insertion of a 2D Sn layer on the backside of silicene permits to take away the Ag substrate, stabilizing silicene which might be simply gated, for instance, by way of the on the highest oxide. Then again, a full 2D encapsulation scheme, the place prime and backside faces of silicene are protected by 2D Sn layers, offers rise to an atomically skinny and cm2-scaled membrane stopping degradation of silicene for months. Each schemes thus represent an development for the silicene stability and encapsulation in ambient circumstances, paving the best way to additional exploitation in versatile electronics and photonics.

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